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Awards

ALD Innovator Award

“For Oringinal Work and Leadership in ALD”

  • 2011: Roy Gordon
  • 2012: Markku Leskela
  • 2013: Steve George
  • 2014: Hyeongtag Jeon
  • 2015: Greg Parsons
  • 2016: Suvi Haukka
  • 2017: Jeff Elam

ALD Student Awards

ALD student awards have been established to recognize outstanding research performed by a graduate student in areas of interest to Atomic Layer Deposition.

Five ALD Student Finalists have been chosen and are listed below. ALD Student Finalists will receive a $500 award upon completing the competition. Competition for the award requires attendance at ALD 2018 and a student presentation of the work in an oral session. The awards will be presented to the winners on the last day of the conference during the closing remarks.

  • Monday, July 30, 2:00 p.m., Room 116-118: AA1-MoA03 – “Room-temperature Resonant Tunneling by Band-offset Engineering of Nanolaminated High-k Oxides Deposited by Atomic-layer Deposition,” Hector Uribe-Vargas‚ Joel Molina-Reyes (National Institute of Astrophysics‚ Optics and Electronics)
  • Monday, July 30, 2:30 p.m., Room 107-109:  AF1-MoA05 – “Atomic Layer Deposition of Aluminum Metal Using a Thermally Stable Aluminum Hydride Reducing Agent,” Kyle Blakeney‚ Charles H. Winter (Wayne State University)
  • Tuesday, July 31, 1:30 p.m., Room 113-115: AS-TuA01 – “Integrated Isothermal Atomic Layer Deposition and Thermal Atomic Layer Etching: “Atomic-Level Processing” for Area-Selective Patterning of TiO2,” Seung Keun Song (North Carolina State University); Paul C. Lemaire (Lam Research Corp.); Gregory N. Parsons (North Carolina State University)
  • Tuesday, July 31, 1:30 p.m., Room 107-109: EM-TuA01 – “Simultaneous Enhancement of Toughness and Elimination of the UV Sensitivity of Kevlar with a Combined ALD/MPI Process,” Itxasne Azpitarte‚ Mato Knez (CIC nanoGUNE‚ Spain)
  • Wednesday, August 1, 11:30 a.m., Room 107-109: NS-WeM15 – “Atomic Layer Deposition of Lead(II) Iodide,” Georgi Popov‚ Miika Mattinen‚ Timo Hatanpää‚ Marko Vehkamäki‚ Marianna Kemell‚ Mikko Ritala‚ Markku Leskelä (University of Helsinki‚ Finland)

The ALD Best Student Paper Award winner will be selected on the basis of the oral presentations (see above), considering quality of research and clarity of presentation. The award is sponsored by Lam Research and consists of a $1,000 cash prize and a certificate.

Several ALD Poster Awards will be given as well, including one sponsored by EpiValence Limited for $100.

ALE Student Awards

ALE student awards have been established to recognize outstanding research performed by a graduate student in areas of interest to Atomic Layer Etching.

Four ALE Student Finalists have been chosen and are listed below. The first place ALE 2018 Best Student Paper Award consists of $1,000.00 USD sponsored by Lam Research and a certificate. The second place ALE 2018 Best Student Paper Award consists of $500.00 USD and a certificate. The awards will be presented to the winners on the last day of the conference during the closing remarks.

The ALE Best Student Paper Award winner will be selected on the basis of the oral presentations (see above), considering quality of research and clarity of presentation. The award is sponsored by Lam Research and consists of a $1,000 cash prize and a certificate.

  • Monday, July 30, 2:45 pm, Room 104-106: ALE1-MoA06 – “Factors in Selectively Etching SiO2 over Si3N4 Using C4F8/Ar Atomic Layer Etching,” Chad Huard‚ Mark Kushner (University of Michigan)
  • Monday, July 30, 4:30 pm, Room 104-106: ALE2-MoA13 – “Isotropic Atomic Layer Etching of ZnO on 3D Nanostructures‚ using Acetylacetone and O2 Plasma,” Alfredo Mameli‚ Marcel Verheijen‚ Adrie Mackus‚ Wilhelmus Kessels (Eindhoven University of Technology‚ Netherlands); Fred Roozeboom (Eindhoven University of Technology and TNO‚ Netherlands)
  • Tuesday, July 31, 9:15 am, Room 104-106: ALE1-TuM06 – “Rapid Atomic Layer Etching of Al2O3 using Sequential Exposures of Hydrogen Fluoride and Trimethylaluminum with No Purging,” David Zywotko (University of Colorado – Boulder); Jacques Faguet (TEL Technology Center‚ America‚ LLC); Steven M. George (University of Colorado – Boulder)
  • Tuesday, July 31, 9:30 am, Room 104-106: ALE1-TuM07 – “Self-limiting Thermal Atomic Layer Etching of Tungsten Metal Using O2 Oxidation and WCl6 or WF6: Role of Halogen Species in Temperature Dependence of ALE Reaction Rate,” Wenyi Xie‚ Paul Lemaire‚ Gregory N. Parsons (North Carolina State University)

Several ALE poster awards will be presented, including three $200 awards and one sponsored by EpiValence Limited for $100.