Overview

The AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) featuring the 5th International Atomic Layer Etching Workshop (ALE 2018) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2018 Workshop (ALE 2018), so that attendees can interact freely. The conference will take place Sunday, July 29-Wednesday, August 1, 2018, at the Songdo Convensia in Incheon, South Korea.

As in past conferences, the meeting will be preceded (Sunday, July 29) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, July 30-August 1) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 600+.

Awards: Both ALD 2018 and ALE 2018 will recognize student achievement with awards for the best student posters and/or talks. See Awards Page

ALD Program Chairs

Program Chair: Jin-Seong Park
Hanyang University, South Korea

Program Co-Chair: Hanjin Lim
Samsung Electronics, South Korea

Program Co-Chair: HyunChul Choi
LG Display, South Korea

ALE Program Chairs

Program Chair: Geun Young Yeom
Sungkyunkwan University, South Korea

Program Co-Chair: Ankur Agarwal
KLA-Tencor, USA

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